Search results for "Multiphoton lithography"
showing 4 items of 4 documents
Non-ionic photo-acid generators for applications in two-photon lithography
2009
Non-ionic photoacid generators (PAGs) have been designed and synthesized for use in two-photon lithography (TPL). The chromophores in these new PAGs are covalently linked to the photocleavable group by a flexible joint. Their thermal stability, solubility and efficiency to produce acid under both one- and two-photon excitation were characterized. The potential of these PAGs for TPL was tested in two negative-tone resist systems relying on different mechanisms: free-radical/cationic polymerization or a cationically initiated cross-linking reaction. These PAGs needed lower threshold power for polymerization compared to a commercially available photoinitiator, isopropylthioxanthone, and a phot…
Creating Defined 3-D Defects Inside an Opaline Ormocer® Matrix with Two-Photon Lithography
2007
The creation of defined structures inside a synthetic opal is a key step toward applications in optics, where control of the propagation of light inside a photonic crystal is necessary. In a previous paper, we described the nanostructuring of Ormocer® to form inverse opals (Lange et al., Macromol. Rapid Commun. 2006, 27, 1746). Here, we report an application for this robust replica process in which defects can be directly produced within the PC by two-photon lithography. The holes of an inverse opal structure are first filled with a resin of similar refractive index. In this transparent material, polymerization can be initiated at defined places via two-photon lithography. After removal of …
3D defect engineering in polymer opals
2006
The possibility to create defined structures inside a synthetic opal is a key step towards applications in optics, where control of the propagation of light inside a photonic crystal is necessary. Here we report different methods for realizing defined embedded defects in opaline structures. Monodisperse colloids are synthesized by surfactant free emulsion polymerization of the acid labile monomer t-butyl-methacrylate (tBMA). The PtBMA colloids can be filled with sensitizer and photo acid generator and it is possible to crystallize them into photosensitive polymer opals. One method for the introduction of defects is a multilayer build-up of photo-labile (filled with photo acid generator) and…
Superconducting tunnel junction fabrication on three-dimensional topography based on direct laser writing
2020
Superconducting junctions are widely used in a multitude of applications ranging from quantum information science and sensing to solidstate cooling. Traditionally, such devices must be fabricated on flat substrates using standard lithographic techniques. In this study, we demonstrate a highly versatile method that allows for superconducting junctions to be fabricated on a more complex topography. It is based on maskless direct laser writing and two-photon lithography, which allows writing in 3D space. We show that high-quality normal metal–insulator–superconductor tunnel junctions can be fabricated on top of a 20-lm-tall three-dimensional topography. Combined with conformal resist coating m…